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太阳能电池片,蓝宝石,光学湿处理设备
Solar Cell substrates, Sapphire,Optical substrate wet process system
   全自动酸/碱减薄制绒设备  Automatic Acid/Alkaline Etching and Texturing System
   PSG刻蚀湿处理设备  Automatic PSG Etching and Cleaning System
   石英炉管湿处理设备  Quartz Tube Clean System
   化学供液及分配系统  Chemical Delivery System (CDS and VMB)
   全自动硅块刻蚀湿处理设备  Automatic Silicon Chunk Etching/Clean System
   全自动硅棒刻蚀湿处理设备  Automatic Silicon Rods Etching/Clean System
   石墨件湿处理设备  Graphite Fixtures Clean System
   晶棒料破碎台  Silicon Robs Materials Break up Table
SNA专利IPA取干设备优点
Advantages of SNA Patent IPA Dryer System
IPA/DI Water Gradient Forms Surface Tension Removal Force
  祛除水迹和颗粒 Eliminates water marks and particles
  比其他工艺效率更高(更快更安全) More efficient than comparable methods(quicker dry and much safer)
  适用于所有薄型基片 Good for all kinds of thinner substrates
  无运动组件 No moving parts at all
  可控温度及雾化量 Controllable vapor temperature and pressure
  低消耗化学液 Less chemical usage
  无碎片事件(有效代替传统甩干机) No fragments (replace traditional dryer efficiently)
集成电路/屏板显示湿处理工艺能力
IC/FPD Wet Process Capability
  RCA液关键清洗 RCA critical cleaning
  最后步骤HF清洗 HF last cleaning
  臭氧去离子水关键清洗 Ozone critical cleaning
  可控BOE刻蚀或氢氧化钾刻蚀 Controlled BOE or KOH etching
  光胶剥离(O3/APM或SPM/APM) Photo resist strip
  聚合物后步刻蚀清洗(FEOL) Post etching (Polymer Removal FEOL)
  氮化物刻蚀 Nitride etching
  客户特殊刻蚀及清洗 Customer specified etching and cleaning
  太阳能电池片酸/碱减薄及制绒 Acid/Alkline etching and texturing for solar cell wafer
  单/多晶硅腐蚀清洗
Mono/Poly Silicon etching and cleaning
 
     
  半导体基片湿处理工艺及清洗
 
  Semiconductor substrate wet process and clean
  单/多晶硅,太阳能电池板湿处理工艺及清洗
  Mono/Poly Silion, Solar Cell wafer wet process and clean
  平板显示器(FPD)湿处理工艺及清洗
  FPD wet process and clean
  化学供液设备及系统
  Chemical Delivery System (CDS and VMB)
     
    
     
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