返回首页 主要业务 典型工艺 技术特性 合理的价格 优质的服务 出众的品质 全方位的解决方案 联系我们
合理的价格
Better Price
第二页
 
 
 
 
 
 
AUTOMATIC MONO/POLY SILICON ETCHING WET BENCH
AUTOMATIC MONO/POLY SILICON ROD CLEAN STATION
 
  所有化学处理工艺由PC系统程序控制,通过液晶触摸屏进行菜单操作。用于对单/多晶硅块的腐蚀、清洗、取干。   由多个工艺槽和机械手组成。操作人员在一组机械手吊钩上放置待处理的晶棒或晶芯,在触摸屏上设置工艺参数后,通过按钮进行工艺操作。  
 

All process recipes are controlled by the PC system’s touch screen. Used for Mono/Poly silicon processes such as etching, rinsing and drying.

 

Consists of multiple process tanks and one robot. The rod is placed on the robot then the touch screen correctly sets the process parameters.  
         
 
 
 
 
 
 
 
 
AUTOMATIC WET PROCESS SYSTEM
 
SEMIAUTOMATIC WET PROCESS SYSTEM
 
  由不同独立的湿处理工艺槽、多组传输机械手及进出料工位组成。按照工艺菜单的设置,机械手在各工艺槽中进行相应的工艺处理。适合用于基片批量的腐蚀/去胶/显影/清洗等工艺.  

由不同独立的湿处理工艺槽组成。按照工艺菜单的设置,机械手在各工艺槽中进行相应的工艺处理。适合用于基片批量的腐蚀/去胶/显影/清洗等工艺.

 
 

This system includes multiple wet process tanks, loading and unloading robots, and transferring robots. The process is run by customer recipe settings. This station is used for the batch process production of wafers such as etching, photo resist stripping, developer and cleaning, etc.

  This system includes multiple wet process tanks. The process is operated by customer recipe settings. This station is used for the batch process production of wafers such as etching, photo resist stripping, developer and cleaning, etc.  
         
 
 
 
 
 
 
 
CHEMICAL DELIVERY SYSTEM
 
NA IPA DRYER
 
 

自动供液系统可以通过分配箱给多台设备进行供液。具有过滤、循环功能,根据用户要求配备双组或者多组过滤、循环系统;当其中一个桶内的液体用完时,能够自动进行双桶切换。同时还具备化学液的取样检测功能。

 

基于SNA专利技术,用于基片湿处理及取干。无水迹,无颗粒增加。

 
  CDS guides the chemicals to multiple wet process stations through the VMBs, configured with the functions of filtration and circulation. It is also an automatic switch double-drum and has a chemical sampling valve.   Based on SNA patented technologies, this is used for substrate wet processing and drying with zero particles added and water mark free.  
    第二页  
 ©2005-2017 上海思恩电子技术有限公司 Shanghai SNA Electronic Technologies Co.,Ltd.   沪ICP备05040272号 联系我们 Contact Us