集成电路/屏板显示湿处理工艺能力
RCA液关键清洗 RCA critical cleaning
最后步骤HF清洗 HF last cleaning
臭氧去离子水关键清洗 Ozone critical cleaning
可控BOE刻蚀或氢氧化钾刻蚀 Controlled BOE or KOH etching
光胶剥离（O3/APM或SPM/APM） Photo resist strip
聚合物后步刻蚀清洗（FEOL） Post etching (Polymer Removal FEOL)
氮化物刻蚀 Nitride etching
客户特殊刻蚀及清洗 Customer specified etching and cleaning
太阳能电池片酸/碱减薄及制绒 Acid/Alkline etching and texturing for solar cell wafer
单/多晶硅腐蚀清洗 Mono/Poly Silicon etching and cleaning
半导体基片湿处理工艺及清洗 Semiconductor substrate wet process and clean
单/多晶硅，太阳能电池板湿处理工艺及清洗 Mono/Poly Silion, Solar Cell wafer wet process and clean
平板显示器（FPD）湿处理工艺及清洗 FPD wet process and clean
化学供液设备及系统 Chemical Delivery System (CDS and VMB)
